Instrument/equipment Core/facility: Yale University Cleanroom

Wet benches

  1. Research Cores Directory
  2. Wet benches

Cleanroom Staff

Building: Becton Engineering and Applied Science Center, 5th floor

About the instrument

A standard piece of laboratory equipment, the cleanroom's four benches are available to ensure that no mixing of incompatible chemicals occurs. They’re dedicated to acid use, base use, solvent use, and the RCA cleaning process. Use policies and procedures are covered during cleanroom orientation, but always contact a staff member before proceeding if there are any questions.

Available to Yale researchers & external researchers

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Equipment

Cleanroom_acid

Acid hood

The acid hood is used for surface treatment of multiple substrates, and the etching of metals, insulators, and semiconductors. Additional PPE is required to use this hood, solvents are not allowed, and extreme caution must be observed while at the hood.

  • Tool manager: Cleanroom staff
  • PPE required: 
    - Safety glasses
    - Face shield
    - Chemical apron
    - Green nitrile gloves
    - White nitrile gloves
  • Chemicals supplied:
    - Buffered oxide etch
    - Sulfuric acid (H2SO4)
    - Hydrochloric acid (HCl)
    - Hydrofluoric acid (HF)
    - Citric acid (C6H8O7)
    - Phosphoric acid (H3PO4)
    - Chrome etch 
    - Nitric acid (HNO3)
    - Aqua regia (HCl + HNO3)
    - Hydrogen peroxide (H2O2)
  • Internal rate: included with cleanroom access
Cleanroom_base

Base hood

The base hood is used for surface treatment of multiple substrates, as well as the development of certain photoresists. Additional PPE is required to use this hood, solvents are not allowed, and extreme caution must be observed while at the hood.

  • Tool manager: Cleanroom staff
  • PPE required:
    - Safety glasses
    - Face shield
    - Chemical apron
    - Green nitrile gloves
    - White nitrile gloves
  • Chemicals Supplied:
    - Resist developers
    - Tetramethylammonium hydroxide (TMAH)
    - Ammonium hydroxide (NH4OH)
    - Hydrogen peroxide (H2O2)
  • Internal rate: Included with cleanroom access
Cleanroom_solvent

Solvent hood

The solvent hood is used for basic wafer cleaning, photoresist removal, and other simple processes. Only basic PPE is required for this chemical hood.

  • Tool manager: Cleanroom Staff
  • Required PPE:
    - Safety glasses
    - White nitrile gloves
  • Supplied chemicals:
    - Acetone
    - Methanol
    - Isopropyl alcohol (IPA)
    - NMP
  • Internal rate: included with cleanroom access
Cleanroom_RCA

RCA hood

Used for extremely clean processing, the CMOS hood is used to conduct the RCA clean technique, capable of removing all organic and metallic contaminants from silicon.

  • Tool manager: Yong Sun
  • Rate: Included with cleanroom access

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