Metrology
Metrology tools offer the ability to characterize thin films, including via an optical microscope, spectral reflectometry, ellipsometry, stylus profiler, and optical profilometer.
Available to Yale researchers & external researchers
About the instrument
The University Cleanroom has a selection of state-of-the-art metrology equipment able to perform measurements on samples before, after, and during processing. Basic equipment includes a standard optical microscope and 4-point probe station.
When measuring surface morphology, the simplest method is contact profilometry. For situations where there are no features, or the surface cannot be touched, non-contact reflectometry can offer a solution. When the optical properties of a film are unknown, ellipsometry is also available.
Equipment
Filmetrics F54-UV Reflectometer
The Filmetrics F54-UV is a film thickness measurement system that utilizes a small spot spectroscopic reflectometer that is coupled with an intuitive and capable software package. With dual halogen and deuterium lamps, the system takes precise measurements of single and multi-layer film stacks, measuring thicknesses ranging from 4 nanometers to 35 microns. The software allows the user to configure measurement recipes for both simple and advanced measurement applications with the ability to select film constants, scan ranges and substrate types. Additionally, the motorized stage allows for measurement of virutally any substrate, and the 25 micron spot size allows for the analysis of patterned films.
- Tool manager: Yeongjae Shin
- Wavelengths: 190 nm to 1100 nm
- Thickness range: 4 nm to 35 µm
- Minimum feature size: 25 µm
- Substrate size: 200 mm or smaller
- Internal rate: Included with access
- User guides: PDF / video
Woollam M-2000 Ellipsometer
The J.A. Woollam M-2000 Ellipsometer is a variable-angle spectroscopic ellipsometer. The xenon light source is capable of measuring films from 240 nm to 1200 nm. With a motorized stage and removable hardware, the system is capable of quick single-site measurements or full wafer film analysis. Users can perform a thickness fitting using pre-existing material files or characterize unknown optical constants. In-situ measurement also exists for active experiments.
- Tool manager: Yeongjae Shin
- Wavelengths: 240 nm to 1200 nm
- Stage options: Heat cell, liquid cell, porous vacuum stage, transmission stage
- Internal rate: Included with access
- User guide: Video
KLA P-7 Stylus Profiler
The KLA-Tencor P-7 contact profiler uses a stylus tip to measure step height, waviness, and roughness of samples. It boasts several advanced features, including a vacuum chuck, multiple location scanning, user-adjustable force control, and sub-angstrom vertical resolution. This system requires a patterned step to measure step height. If one does not exist, consider a non-contact method such as ellipsometry or reflectometry.
- Tool manager: Yeongjae Shin
- Maximum step height: 400 microns
- Maximum range: 1000 microns
- Stylus tip radius: 2 microns
- Internal rate: Included with access
- User guide: PDF / Video
Zeta-20 Optical Profiler
The Zeta-20 Optical Profilometer is a non-contact optical profiler capable of performing non-contact measurement and detailed analysis of large step heights and surface morphology. It is best suited to measuring reflective surfaces but has the capability to measure thin films and some transparent substrates. The system also doubles as a high-resolution full-color microscope with 5X to 100X magnification.
- Tool manager: Yeongjae Shin
- Available objectives: 5X, 10X, 20X, 50X, 100X
- Minimum XY resolution: 90 nanometers
- Minimum Z resolution: 40 nanometers
- Internal rate: Included with access
- User guide: Video
Bruker ContourX-500 Optical Profiler
The ContourX-500 Optical Profilometer is an automated benchtop system for fast, non-contact 3D surface metrology. It can be used for etch depth, film thickness, step-height, and surface roughness measurements. The tool can also do automated stitching to take scans of large areas. The x-y pixel size is 0.38 um and the Z direction has angstrom level resolution.
- Tool manager: Yeongjae Shin
- Internal rate: Included with access
- User guide: PDF