Metrology
Yeongjae Shin
Staff ScientistBuilding: Becton Engineering and Applied Science Center, 5th floor
About the instrument
The University Cleanroom has a selection of state-of-the-art metrology equipment able to perform measurements on samples before, after, and during processing. Basic equipment includes a standard optical microscope and 4-point probe station.
When measuring surface morphology, the simplest method is contact profilometry. For situations where there are no features, or the surface cannot be touched, non-contact reflectometry can offer a solution. When the optical properties of a film are unknown, ellipsometry is also available.
Available to Yale researchers & external researchers
Equipment list
- Filmetrics F54-UV Reflectometer
- Woollam M-2000 Ellipsometer
- KLA P-7 Stylus Profiler-1
- KLA P-7 Stylus Profiler-2
- Bruker ContourX-500 3D Optical Profiler
- Zygo Nexview 3D Optical Profiler
- Zeta-20 Optical Microscope
- Olympus BX53MRF Optical Microscope
- Celestron S10-60 Stereo Microscope
Filmetrics F54-UV Reflectometer
The Filmetrics F54-UV is a spectroscopic reflectometer used to measure the thickness of thin films from 4 nm to 35 μm. Equipped with halogen and deuterium lamps and a 25 μm spot size, it supports both simple and multi-layer film stacks on substrates up to 200 mm. Its motorized stage allows for patterned film analysis with sub-100 μm features.
- Wavelength range: 190–1100 nm
- Thickness range: 4 nm – 35 μm
- Minimum spot size: 25 μm
- Substrate size: ≤ 200 mm
- Tool manager: Yeongjae Shin
- Location: Main Campus Cleanroom
- Rate: Included with access
- User guide: PDF / Video
Woollam M-2000 Ellipsometer
This variable-angle spectroscopic ellipsometer measures film thickness and optical constants across 240–1200 nm. It supports both single-site and full-wafer analysis with various optional stages including heating, liquid, vacuum, and transmission stages. In-situ measurements are also supported for live experiments.
- Wavelength range: 240–1200 nm
- Stage options: Heat cell, liquid cell, vacuum, transmission
- Tool manager: Yeongjae Shin
- Location: Main Campus Cleanroom
- Rate: Included with access
- User guide: Video
KLA P-7 Stylus Profiler-1
A contact-based step height profiler capable of sub-angstrom vertical resolution. The system uses a 2 μm stylus tip and offers a vacuum chuck, programmable scan paths, and user-adjustable stylus force. It is ideal for measuring surface step heights, roughness, and waviness on patterned surfaces.
Max step height: 440 μm
Max scan range: 1000 μm
Stylus tip radius: 2 μm
- Tool manager: Yeongjae Shin
- Location: Main Campus Cleanroom
- Rate: Included with access
- User guide: PDF / Video
KLA P-7 Stylus Profiler-2
The KLA P-7 at West Campus offers contact-based surface profiling for step height, surface roughness, and waviness measurements. Identical in functionality to the Main Campus system, it supports sub-angstrom vertical resolution and programmable scans using a 2 μm stylus tip. Available for local users seeking precision contact metrology within the West Campus cleanroom.
- Max step height: 440 μm
- Max scan range: 1000 μm
- Stylus tip radius: 2 μm
- Tool manager: Yeongjae Shin
- Location: West Campus Cleanroom
- Rate: Included with access
- User guide: PDF / Video
Bruker ContourX-500 Optical Profiler
An advanced benchtop 3D surface metrology system for non-contact measurements of etch depth, step height, roughness, and film thickness. Offers automated stitching for large-area scans and high vertical resolution.
- XY pixel size: 0.38 μm (field-of-view dependent)
- Z resolution: Angstrom-level
- Tool manager: Yeongjae Shin
- Location: Main Campus Cleanroom
- Rate: Included with access
- User guide: PDF
Zygo Nexview 3D Optical Profiler
A high-end, fully automated 3D optical profiler with sub-nanometer vertical resolution. The system excels at analyzing smooth to rough surfaces, steep slopes, and large step heights. It supports measurement of flatness, roughness, thin films, and slope profiles across various feature sizes.
- XY pixel size: 0.38 μm (field-of-view dependent)
- Feature height: < 1 nm to 20 mm
- Tool manager: Yeongjae Shin
- Location: West Campus Cleanroom
- Rate: Included with access
Zeta-20 Optical Profiler
A non-contact optical profiler that provides detailed 3D surface profiles and step height analysis. It is optimized for reflective surfaces and transparent substrates and can operate as a high-resolution microscope with magnification from 5X to 100X.
- Objectives: 5X, 10X, 20X, 50X, 100X
- Tool manager: Yeongjae Shin
- Location: Main Campus Cleanroom
- Rate: Included with access
- User guide: Video
Olympus BX53MRF Optical Microscope
A flexible bright/dark-field optical microscope with objectives ranging from 5X to 100X. Features include HDR imaging, full-focus (EFI), panorama stitching (MIA), and auto-calibration. Designed for high-precision observation and analysis with stable illumination and advanced optical correction.
Objectives: 5X, 10X, 20X, 50X, 100X
Features: MIX, HDR, EFI, Instant MIA, wavefront correction
- Tool manager: Yeongjae Shin
- Location: West Campus Cleanroom
- Rate: Included with access
Celestron S10-60 Stereo Microscope
A low-power stereo microscope offering up to 60X magnification with glass optics, full-metal housing, and top/bottom illumination. Ideal for quick inspections and macro-level observation.
Magnification: 10X, 20X, 30X, 60X
Eyepieces: 10X and 20X
Objectives: 1X and 3X
Illumination: Upper and lower
- Tool manager: Yeongjae Shin
- Location: West Campus Cleanroom
- Rate: Included with access